The Next Generation Laue System

Laue single-crystal orientation systems are crucial for crystal cutting, polishing, preparation for large facility experiments and many industrial applications such as turbine blade manufacturing. Key performance of these systems is measured by the accuracy of the alignment, cycle time and ease of use of Laue software.

Our system combines several key innovations to deliver the next generation of Laue single-crystal orientation. A high-resolution, high-sensitivity and robust X-ray CCD camera has an unbeaten active area for measuring Laue diffraction spots. A custom air-cooled X-ray beam solution eliminates the need for a water chiller while delivering a high-brilliance X-ray beam with a spot size of 450 µm for a standard system.

A dedicated software suite allows users to drive the stages, X-ray source, camera, and perform Laue analysis. The Laue analysis tool is crucial for speeding up the orientation of single crystals with automatic peak indexing, making it a truly user-friendly and efficient tool.

This combination of high detector resolution, bright diffraction peaks and small spot size leads to a typical exposure time of 1-3 seconds with an accuracy of 0.1 degrees for a Si reference sample. The result is a fast and accurate Laue single-crystal orientation tool designed with ease of use in mind, delivering the next generation of Laue single-crystal orientation systems.

Key Features

• Available in Vertical, Horizontal, and Grain Map configurations
• Plug-n-Play compact cabinet system - no customised bench or additional services required
• Fully automated and motorised XYZ Stages and Goniometer, with manual options available
• CCD back reflection, high-resolution, high-sensitivity X-ray detector
• Air-cooled X-ray source – no water chiller necessary
• Small beam size of 450 µm standard and 250 µm with fine focus
• Fast and precise alignment of small crystals with on-board high-resolution viewing camera
• Distance measurement tool for precise and reproducible sample positioning for vertical configuration
• Dedicated Laue Software for full control, data acquisition, processing and analysis
• High-throughput sample screening options

Vertical Laue Configuration

The most flexible configuration, the Vertical Laue system uses a vertical beam path for high throughput scanning of multiple crystals in isolation or multiple areas of interest. Using gravity, samples do not need to be adhered to the platform, allowing for easier mounting, and orienting of crystals. With a <450µm beam size both sub-millimetric range samples and larger components like turbine alloys are accommodated.

Horizontal Laue Configuration

The Laue System is also available with a traditional horizontal geometry. A horizontal Laue System is well suited to orient the crystal for cutting or to quickly scan the crystal to identify reflections. This configuration is typically suited by those doing crystal cutting, who want the geometry of the Laue experiment to match the cutter.

Grain Map Configuration

A vertical system featuring a special camera, lens, illumination, and mapping software to measure the orientation of each grain. Grain Map includes a fully motorised XYZ Stage Goniometer and fine focus optics as standard, and is ideal for grain mapping silicon wafers.